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PVA Brush Roller description:
Our PVA Brush Roller is applied to semiconductor, rigid disk & sapphire wafer industries. Our products are able to remove particles from wafer and disk media efficiently. We design and manufacture PVA products to meet the customer needs of each unique application and accept customization service.
Nowadays，wafer and semiconductor field have higher and higher requirement for PVA Brush.They need the PVA Nodular Brush have high purity，no dust drop off,good water absorbing and adsorptivity and longer lifespan. Our factory is adopt the industry needs constantly push forward innovation,make our brush roller to be the best on the filed.
Material: PVA nodular roller is made by 100% synthetic polyvinyl Acetal(PVA) Construction
Physical characteristics
| 30% compressive stress | 110-120 g/cm2 |
| Apparent Density | 0.11-0.13 g/cm3 |
| Tensile Strength | 4.7-5.6 kgf/cm2 |
|
Elongation at Break
|
320%
|
|
Tearing Strength
|
2.3 ~ 2.6 kgf/cm
|
|
Porosity
|
90 ~ 92%
|
|
AVG pore size
|
100 ~ 130um
|
PVA nodular brush feature:
* High cleanliness and low residual
* Accordance with the requirements of the high level process & cleaning
* High quality and fast lead time
Application of nodular brush
1. Wafer cleaning
2. Hard disc media and substrate
3. CMP cleaning
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